The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2003

Filed:

Jan. 29, 2001
Applicant:
Inventors:

Yifeng Wu, Goleta, CA (US);

Naiqing Zhang, Goleta, CA (US);

Jian Xu, Thousand Oaks, CA (US);

Lee Mc Carthy, Chapel Hill, NC (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/9778 ;
U.S. Cl.
CPC ...
H01L 2/9778 ;
Abstract

New Group III nitride based field effect transistors and high electron mobility transistors are disclosed that provide enhanced high frequency response characteristics. The preferred transistors are made from GaN/AlGaN and have a dielectric layer on the surface of their conductive channels. The dielectric layer has a high percentage of donor electrons that neutralize traps in the conductive channel such that the traps cannot slow the high frequency response of the transistors. A new method of manufacturing the transistors is also disclosed, with the new method using sputtering to deposit the dielectric layer.


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