The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2003

Filed:

Mar. 16, 2000
Applicant:
Inventors:

Philip S. Flanigan, South Burlington, VT (US);

Dennis M. Hayden, Essex Junction, VT (US);

Michael S. Hibbs, Westford, VT (US);

Timothy E. Neary, Essex Junction, VT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; G03C 5/00 ; B05B 3/00 ; C23C 1/402 ;
U.S. Cl.
CPC ...
G03F 9/00 ; G03C 5/00 ; B05B 3/00 ; C23C 1/402 ;
Abstract

The current invention performs short pulse laser ablation of clear defect regions on a mask prior to patching the clear defect regions. The short-pulse laser ablation removes any residue that absorbs light. Thus, the ablation completely cleans the surface of the clear defect regions, meaning that any patches of the surface will better adhere to the surface of the mask. This is particularly important during those situations where a later etch of a conductive surface added to the mask creates a solvent because the etchant interacts with residue on the mask, and wherein the solvent attacks the patch material at the patch material's interface.


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