The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2003
Filed:
Mar. 02, 2001
Lee Luo, Fremont, CA (US);
Henry Ho, San Jose, CA (US);
Shulin Wang, Campbell, CA (US);
Binh Hoa Tran, San Jose, CA (US);
Alexander Tam, Union City, CA (US);
Errol A. C. Sanchez, Dublin, CA (US);
Xianzhi Tao, Palo Alto, CA (US);
Steven A. Chen, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Provided herein is an emissivity-change-free pumping plate kit used in a single wafer chamber. This kit comprises a top open pumping plate, and optionally a skirt and/or a second stage choking plate. The skirt may be installed around the wafer heater, underneath the wafer heater, or along the chamber body inside the chamber. The choking plate is installed downstream of the top open pumping plate along the purge gas flow. Also provided is a method of preventing emissivity change and further providing optimal film thickness uniformity during wafer processing by utilizing such kit in the chamber.