The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2003

Filed:

May. 09, 2000
Applicant:
Inventors:

Michael J. McNallan, Oak Park, IL (US);

Daniel Ersoy, Lincolnwood, IL (US);

Yury Gogotsi, Lombard, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C10M / ; F16C 3/312 ;
U.S. Cl.
CPC ...
C10M / ; F16C 3/312 ;
Abstract

A process for the synthesis of carbon coatings on the surface of metal carbides, preferably SiC, by etching in a halogen-containing gaseous etchant, and optionally hydrogen gas, leading to (he formation of a carbon layer on the metal carbide. The reaction is performed in gas mixtures containing about 0% (trace) amounts to 100% halogen-containing gaseous etchant, e.g., Cl , and about 0% to 99.9% H (hydrogen gas) at temperatures from about 100° C. to about 4,000° C., preferably about 800° C. to about 1,200° C., over any time range, maintaining a pressure of preferably about one atmosphere, to about 100 atmospheres.

Published as:
WO0116054A2; AU1327101A; WO0116054A3; EP1228020A2; US6579833B1; EP1228020B1; ATE269282T1; DE60011663D1; ES2223608T3; DE60011663T2;

Find Patent Forward Citations

Loading…