The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2003
Filed:
Apr. 11, 2000
Applicant:
Inventors:
Reed Gleason, Portland, OR (US);
Michael A. Bayne, Beaverton, OR (US);
Kenneth Smith, Portland, OR (US);
Assignee:
Cascade Microtech, Inc., Beaverton, OR (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01R 4/316 ;
U.S. Cl.
CPC ...
H01R 4/316 ;
Abstract
A method for constructing a membrane probe that includes providing a substrate, and creating a depression within the substrate. Conductive material is located within the depression and a conductive trace is connected to the conductive material. A membrane is applied to support the conductive material and the substrate is removed from the conductive material.
Gleason, Reed. (2003). Method for constructing a membrane probe using a depression (U.S. Patent No. 6578264). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6578264
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile