The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2003

Filed:

Aug. 31, 1999
Applicant:
Inventor:

Hironori Sakamoto, Tokyo, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 1/750 ;
U.S. Cl.
CPC ...
G06F 1/750 ;
Abstract

In a method of extracting parameters of a diffusion model from object parameters to be used in a process simulation of a semiconductor manufacturing process, classifying the object parameters into a first through an N-th (N being a natural integer not smaller than ) groups, the first group being used for classifying thereinto the most fundamental physical and least model-dependent parameters, the N-th group being used for classifying thereinto the least fundamental physical and most model-dependent parameters, and extracting successively the classified parameters in the first through the N-th groups in the order from the first to the N-th group.


Find Patent Forward Citations

Sakamoto, Hironori. (2003). Method of extracting parameters of diffusion model capable of extracting the parameters quickly (U.S. Patent No. 6577993). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6577993

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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