The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2003

Filed:

Mar. 30, 1999
Applicant:
Inventors:

Shih Hui Chang, Taipei, TW;

Kuo-Hsien Cheng, Hsin Chu, TW;

Cheng Kun Lin, Taipei-Hsien, TW;

Wen Zen Chiu, Feng Yuan, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G05B 2/100 ;
U.S. Cl.
CPC ...
G05B 2/100 ;
Abstract

Faults occurring in the operation of a rapid thermal process system are detected and dynamically controlled in-situ. A data set is generated which represents the power applied to heating elements which are spatially arranged in a plurality of zones. The data is converted to a sequence of fractions respectively representing the power applied to each zone relative to the total applied power. The fractions are sequentially arranged and a least squares straight line fit for the fractions is calculated. The slope of the calculated straight line fit is used in a statistical process control system to determine whether a fault has occurred, and to make appropriate corrections in process control parameters, such as the length of time the process is carried out.


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