The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2003
Filed:
May. 08, 2002
Applicant:
Inventor:
Yoshihiro Koyama, Chiba, JP;
Assignee:
Seiko Instruments Inc., , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/708 ;
U.S. Cl.
CPC ...
H01J 3/708 ;
Abstract
A focused ion beam apparatus has a gas injector provided with a plurality of gas supply pipes each having a nozzle at one end for ejecting a gas and a housing in which the plurality of gas supply pipes are slidably accommodated. The housing has a tip portion with a hole provided at a terminal end thereof and the hole has a size set so that only one of the nozzles can extend therefrom. In addition, the housing has a tapered nozzle guide portion for guiding a selected nozzle from a retracted position at which the selected nozzle does not extend from the hole to an extended position at which the selected nozzle extends from the hole.