The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2003

Filed:

Feb. 27, 2002
Applicant:
Inventors:

Clarence Chui, Emeryville, CA (US);

Mark W. Miles, San Francisco, CA (US);

Assignee:

Iridigm Display Corporation, San Francisco, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 2/600 ; G02F 1/03 ; G02F 1/07 ;
U.S. Cl.
CPC ...
G02B 2/600 ; G02F 1/03 ; G02F 1/07 ;
Abstract

One aspect of the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating an array of first elements, each first element conforming to a first geometry; fabricating at least one array of second elements, each second element conforming to a second geometry; wherein fabricating the arrays comprises selecting a defining aspect of each of the first and second geometries based on a defining characteristic of each of the first and second elements; and normalizing differences in an actuation voltage required to actuate each of the first and second elements, wherein the differences are as a result of the selected defining aspect, the defining characteristic of each of the elements being unchanged.

Published as:
US6574033B1; WO03073151A1; AU2002308517A1; KR20040088549A; EP1488271A1; CN1633616A; JP2005525776A; JP4223406B2; CN100472270C; KR100944922B1; USRE42119E; EP1488271A4;

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