The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2003
Filed:
Nov. 08, 2001
Carole D. Graas, Dresden, DE;
Robert H. Havemann, Garland, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
An interconnect structure having refractory sidewalls for enhanced yield, performance and reliability. The primary purpose of the refractory metal is to getter sidewall impurities, residual polymers, and corrosive species by-products from the plasma etch and cleanup processes used to pattern interconnects. In a preferred embodiment, the refractory metal reacts with the conducting layer to form an intermetallic which further enhances the endurance of the metallization against stress-induced rupturing and via-induced electromigration. The disclosed structures and methods are particularly advantageous in “zero-overlap” designs, and aggressive pitch patterns where linewidth and corrosion control are critical, but are also advantageous in “Damascene” pattern definition applications.