The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2003
Filed:
Oct. 09, 2001
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
After depositing a metal film on an insulating film on a semiconductor substrate, a first interlayer insulating film is formed on the metal film. After forming first plug openings in the first interlayer insulating film by etching the first interlayer insulating film with a first mask pattern used as a mask, first connection plugs are formed by filling a first conducting film in the first plug openings. A second interlayer insulating film is formed on the first interlayer insulating film. After forming second plug openings respectively on the first connection plugs in the second interlayer insulating film by etching the second interlayer insulating film with a second mask pattern used as a mask, second connection plugs are formed by filling a second conducting film in the second plug openings. The metal film is etched by using at least the first connection plugs and the second connection plugs as a mask so as to form metal interconnects, and then, a third interlayer insulating film is formed on the metal interconnects so as to form an air gap between the metal interconnects.