The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2003
Filed:
Mar. 28, 2001
Darren Livingston, Denver, CO (US);
Youfan Gu, Superior, CO (US);
Paul Dozoretz, Thornton, CO (US);
James M. Mueller, Lafayette, CO (US);
MKS Instruments, Inc., Andover, MA (US);
Abstract
Trap apparatus and method for removing contaminants from the gaseous effluent flows from chemical vapor deposition chambers and processes by flowing the particle laden gas into an upper chamber of the trap apparatus, imparting additional kinetic energy to the powder particles to enhance separation of the powder particles from the gas, and then flowing the gas, sans the powder particles, out of the trap, while the powder particles fall into and are captured by a lower chamber positioned below the upper chamber and remote from the flowing gas. An impeller positioned in the upper chamber in the inlet path imparts the additional kinetic energy. For some reaction gas systems, an optional reactor with hydrophillic, rotating growth substrates enhance and accelerate growth of solid particles, which are then dislodged from the media, and fed by the flowing gas into the upper chamber for capture as previously described.