The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2003
Filed:
Dec. 28, 2000
Applicant:
Inventors:
Ernst Hendrik August Granneman, Hilversum, NL;
Vladimir Ivanovich Kuznetsov, Delft, NL;
Gert Jan Snijders, Amersfoort, NL;
Assignee:
ASM International N.V., Bilthoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F26B 2/506 ; F26B 7/00 ; B65G 4/907 ;
U.S. Cl.
CPC ...
F26B 2/506 ; F26B 7/00 ; B65G 4/907 ;
Abstract
Apparatus, method and system for the treatment of a wafer. After a treatment at elevated temperature, a wafer is taken out of the reactor in question with the help of a mechanical transport apparatus which preferably grips the wafer around the circumference and on the under side and consists of a wafer surrounding ring. The wafer is then placed in a floating wafer reactor where it is cooled in a controlled manner. Transport for further action or treatment then takes place.