The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2003
Filed:
Aug. 07, 2001
Martin Gutsche, Dorfen, DE;
Alexander Gschwandtner, München, DE;
Infineon Technologies AG, Munich, DE;
Abstract
The method according to the invention enables the roughness of an HSG surface to be substantially transferred to the surface of an electrode. The electrode consequently acquires a microstructured surface, the area of which can be increased by more than 25%, preferably by more than 50% and particularly preferably by more than 100%. An HSG layer is used to locally mask the electrode surface or the sacrificial layer. Subsequent structuring processes, such as for example wet-chemical and/or plasma-assisted etching processes, nitriding or oxidation processes, make it possible—working on the basis of micromasking effects—to significantly roughen the electrode surface and thereby to increase the electrode surface area.