The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2003
Filed:
Nov. 16, 2000
Guoqiang Xing, Dallas, TX (US);
Scott R. Summerfelt, Dallas, TX (US);
Rajesh Khamankar, Irving, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A method for etching a feature in a platinum layer overlying a second material without substantially etching the second material. The method includes the the steps of: forming an adhesion-promoting layer between the platinum layer and the second material; forming a hardmask layer over the platinum layer; patterning and etching the hardmask layer in accordance with desired dimensions of the feature; and etching portions of the platinum layer not covered by the hardmask layer , the etching stopping on the adhesion-promoting layer. In further embodiments the adhesion-promoting and hardmask layers are Ti—Al—N including at least 1% of aluminum.