The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2003
Filed:
Feb. 22, 2002
Wai Leung, Ames, IA (US);
Kristen Constant, Ames, IA (US);
Kai-Ming Ho, Ames, IA (US);
Mihail Sigalas, Santa Clara, CA (US);
Henry Kang, Miami, FL (US);
Chang Hwan Kim, Ames, IA (US);
David Cann, Ames, IA (US);
Jae Hwang Lee, Ames, IA (US);
Iowa State University Research Foundation, Ames, IA (US);
Abstract
A method of manufacturing photonic band gap structures operable in the optical spectrum has been presented. The method comprises the steps of creating a patterned template for an elastomeric mold, fabricating an elastomeric mold from poly-dimethylsiloxane (PDMS) or other suitable polymer, filling the elastomeric mold with a second polymer such as epoxy or other suitable polymer, stamping the second polymer by making contact with a substrate or multilayer structure, removing the elastomeric mold, infiltrating the multilayer structure with ceramic or metal, and heating the multilayer structure to remove the second polymer to form a photonic band gap structure.