The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2003
Filed:
Apr. 03, 2001
Applicant:
Inventors:
Shawming Ma, Sunnyvale, CA (US);
Ralph H M Straube, Sunnyvale, CA (US);
Assignee:
Applied Materials Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/13065 ; C23C 1/600 ;
U.S. Cl.
CPC ...
H01L 2/13065 ; C23C 1/600 ;
Abstract
A plasma chamber apparatus and method having a process kit capable of reducing or eliminating electrical arcing from exposed metal at the perimeter of a workpiece. The plasma chamber includes a cathode electrode adjacent the workpiece. A process kit encircles the perimeter of the workpiece. The process kit includes a dielectric shield and an electrically conductive collar that overlies the dielectric shield. The resistivity of the conductive collar is 0.1 ohm-cm or less.
Ma, Shawming. (2003). Conductive collar surrounding semiconductor workpiece in plasma chamber (U.S. Patent No. 6554954). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6554954
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile