The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2003
Filed:
Oct. 17, 2000
E. Jennings Taylor, Troy, OH (US);
Faraday Technology Marketing Group, LLC, Troy, OH (US);
Abstract
Microscopic mechanical elements suitable for manufacture of microelectromechanical systems (MEMS) are directly prepared by forming a low-relief base of microscopic dimensions on a substrate surface by any conventional means, and electrodepositing a metal preferentially on the upper surface of the base to produce a vertically-extending 3-dimensional structure. In a first step, the patterned substrate and a counterelectrode are contacted with an electrolyte and an electric current is passed between the substrate and counterelectrode, with the substrate being predominantly cathodic with respect the counterelectrode. In a first step the electrolytic environment at the substrate surface is maintained as a microprofile, whereby metal is deposited preferentially at the upper edge or tip of the base until the structure has been increased in height, and, in a second step, the electrolytic environment at the substrate surface is maintained as a macroprofile to continue the deposition of metal at the upper edge or tip of the structure until the desired relief is obtained.