The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 22, 2003

Filed:

Oct. 20, 2000
Applicant:
Inventors:

Daniel R. Neal, Tijeras, NM (US);

Darrell J. Armstrong, Albuquerque, NM (US);

Daniel M. Topa, Albuquerque, NM (US);

Richard J. Copland, Albuquerque, NM (US);

Assignee:

WaveFront Sciences, Inc., Albuquerque, NM (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 3/10 ;
U.S. Cl.
CPC ...
A61B 3/10 ;
Abstract

An ophthalmic error measurement system includes a projecting optical system delivering light onto a retina of an eye, a pre-correction system which compensates a light beam to be injected into the eye for aberrations in the eye, the pre-correction system being positioned in between the projecting optical system and the eye, an imaging system which collects light scattered by the retina, and a detector receiving light returned by the retina from the imaging system. Use of the pre-correction system allows the end-to-end aberrations of the ocular system to be analyzed. The use of a pre-correction system also allows use of a minimized spot size on the retina, and all of its attendant advantages.


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