The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 15, 2003

Filed:

Sep. 21, 2000
Applicant:
Inventors:

Hiroaki Narushima, Tokyo, JP;

Toshihiko Tsuji, Urawa, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 1/42 ;
U.S. Cl.
CPC ...
G01J 1/42 ;
Abstract

An illuminance meter is provided to simplify measuring tasks and labor associated with the process of determining the energy level of a radiation used in an exposure apparatus. A wafer-type illuminance meter has an optical sensor fabricated integrally within a dummy wafer, which is made of a thin disk so that it may be handled in a manner similar to a substrate wafer to be imprinted. The illuminance meter is retained on a wafer stage in a manner similar to the substrate wafer so as to be loaded on and unloaded off a number of exposure apparatuses to determine a level of illuminance in the vicinity of the image plane of each exposure apparatus that uses a type of radiation assigned to each exposure apparatus.


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