The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2003
Filed:
Jul. 02, 1999
Applicant:
Inventor:
Tetsuo Taniguchi, Yokohama, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/742 ; G03B 2/754 ; G03B 2/772 ;
U.S. Cl.
CPC ...
G03B 2/742 ; G03B 2/754 ; G03B 2/772 ;
Abstract
An exposure apparatus comprises an illumination optical system for irradiating an illuminating light onto a mask having a plurality of patterns for which pattern forming conditions differ from one another, and a projection optical system for projecting images of said plurality of patterns onto a photosensitive substrate, a device for compensating imaging errors of pattern images to be projected onto said substrate, and a control system for controlling the operation of said compensating device in accordance with imaging errors of said plurality of pattern images so that said plurality of pattern images may be projected in specified imaging characteristics.