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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6548613 B1

PDFFull Text
Date of Patent:
Apr. 15, 2003

Filed:

Dec. 22, 2000

Organic anti-reflective coating polymer and preparation thereof

Applicant:
Inventors:

Min-Ho Jung, Gyunggi-do, KR;

Sung-Eun Hong, Gyunggi-do, KR;

Jae-Chang Jung, Gyunggi-do, KR;

Geun-Su Lee, Gyunggi-do, KR;

Ki-Ho Baik, Gyunggi-do, KR;

Assignee:

Hyundai Electronics Industries Co., Ltd., , KR;

Attorney:

Townsend and Townsend and Crew LLP

Primary Examiner:

Tatyana Zalukaeva

Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
C08F / ;
Abstract

The present invention provides a polymer that can be used as an anti-refelctive coating (ARC) polymer, an ARC composition comprising the same, methods for producing the same, and methods for using the same. The polymer of the present invention is particularly useful in a submicrolithographic process, for example, using KrF (248 nm), ArF (193 nm), or F (157 nm) laser as a light source. The polymer of the present invention comprises a chromophore that is capable of absorbing light at the wavelengths used in a submicrolithographic process. Thus, the ARC of the present invention significantly reduces or prevents back reflection of light and the problem of the CD alteration caused by the diffracted and/or reflected light. The ARC of the present invention also significantly reduces or eliminates the standing wave effect and reflective notching. Therefore, the polymer of the present invention can be used to produce a stable ultrafine pattern that is suitable in manufacturing of 64 M, 256 M, 1 G, 4 G and 16 G DRAM semiconductor devices. Moreover, the ARC of the present invention significantly improves the production yield, of such semiconductor devices.

Find Patent Forward Citations

Jung, Min-Ho. (2003). Organic anti-reflective coating polymer and preparation thereof (U.S. Patent No. 6548613). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6548613

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