The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 08, 2003

Filed:

Sep. 09, 1999
Applicant:
Inventors:

Yasuo Manabe, Kawasaki, JP;

Hiromi Hoshino, Kawasaki, JP;

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/750 ;
U.S. Cl.
CPC ...
G06F 1/750 ;
Abstract

According to a menu item selected in step S (a pressed command button), for a wafer exposing pattern, program goes to steps S and S and further, display in step S inspection in step S or modification in step is performed; for a block pattern on a stencil mask, program goes to steps and and further display in step S inspection in step S or modification in step S is performed. In step S exposure simulation is performed, in step S a result thereof is displayed and in step S wafer exposing pattern data are modified based on the result. When a block pattern on a stencil mask is modified, the instances of the block pattern in the wafer exposing pattern data is simultaneously modified as well.


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