The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2003
Filed:
Jun. 05, 2000
Applicant:
Inventor:
Ziad R. Hatab, Boise, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/3544 ;
U.S. Cl.
CPC ...
H01L 2/3544 ;
Abstract
A semiconductor wafer with reduced misalignment errors at its periphery and a method for producing such a semiconductor wafer are described. The wafer includes one or more global alignment sites, having global alignment marks, on its periphery. Some patterning is located on the global alignment sites, but not covering the global alignment marks. The patterning covering the global alignment sites reduces the amount of non-correctable misalignment errors experienced by the wafer. A buffer zone is provided around the global alignment marks to inhibit patterning over the marks.