The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2003
Filed:
Oct. 26, 2001
Applicant:
Inventor:
Takashi Kaito, Chiba, JP;
Assignee:
Seiko Instruments Inc., , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1311 ;
U.S. Cl.
CPC ...
H01L 2/1311 ;
Abstract
A method for forming a vertical edge submicron through-hole comprises the steps of; forming a hole on a sample thin film with a larger diameter than design size of a through-hole, with a bottom having a thickness close to the design size remaining, by etching using a focused ion beam device; forming a through-hole with the design size on the bottom section by focused ion beam etching; and backfilling the large hole to the design size by deposition using a focused ion beam device.