The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6544803 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 08, 2003

Filed:

Apr. 17, 2001
Applicant:
Inventors:

Gayle Buhrer, Meridian, ID (US);

Zane L. Drussel, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 3/126 ;
U.S. Cl.
CPC ...
G01R 3/126 ;
Abstract

Methods for determining the location of a droplet of water placed on a surface of a semiconductor wafer and for determining the concentration of contamination on a semiconductor wafer surface. One method includes placing a droplet of liquid on the semiconductor wafer surface and generating reference indicia indicative of a location of the droplet on the surface. Another method includes establishing first and second reference axes that intersect at a point and superimposing the point over a droplet of water on the semiconductor wafer surface. A first reference coordinate indicative of the position of the point along the first axis and a second reference coordinate indicative of the position of the point along the second axis are generated.


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