The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2003
Filed:
Jul. 17, 2001
James A. Bruce, Williston, VT (US);
Orest Bula, Shelburne, VT (US);
Edward W. Conrad, Jeffersonville, VT (US);
William C. Leipold, Enosburg Falls, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Method for effecting edge bias correction of topography-induced linewidth variations which are encountered in printed or integrated circuits on substrates or semiconductor devices for electronic packages. The method modifies data for current levels which is predicated on prior level data and models, as to the manner in which topography will affect the resist and/or antireflective coating (ARC) thicknesses, so as to improve upon linewidth (LW) control and, in general, imparting improved processing windows. The method can be implemented in the form of computer-executable instructions which are embodied in one or more program modules stored on computer-usable media.