The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2003
Filed:
Apr. 25, 1994
Hans-Werner Stankewitz, Wetzlar, DE;
Leica Microsystems Wetzlar GmbH, Wetzlar, DE;
Abstract
An epi-illumination interference attachment according to Mirau that can be mounted onto the objective ( ) of a microscope as a two-ray interference attachment module ( ). The attachment has a reference mirror ( ) and several beam splitters ( ) which are affixed on a carrier such as turret plate ( ). The beam splitters ( ) show specific reflection/transmission characteristics (R/T values), especially 20/80, 35/65, 43/57, and 50/50. The reference mirror ( ) shows, for instance a reflection value of 85 percent. With the installation according to this invention, objects ( ) with very different reflection values can be observed and measured without any contrast problems.