The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2003
Filed:
May. 17, 2001
Koichi Kamijo, Kawasaki, JP;
Nikon Corporation, Tokyo, JP;
Abstract
Methods are disclosed for calculating exposure energy on a sensitive substrate as realized whenever the substrate is exposed with a reticle pattern. The reticle pattern is divided into regions each defining one or more respective pattern elements. The respective pattern element(s) in the various regions are represented by a respective representative figure having an aspect ratio that reflects the aspect ratio of the pattern elements in the region. The representative figure also has an area equal to the collective area(s) of the respective pattern element(s) in the region, and a centroid located at the centroid of the pattern element(s) in the region. If (1) the direction of one side of the representative figure is in the X-axis direction, (2) the direction of a perpendicular side of the representative figure is in the Y-direction, (3) the sum of the moment of inertia of the actual respective pattern element(s) around an axis parallel to the X-axis and passing through the centroid is I , and (4) the sum of the moment of inertia of the actual pattern element(s) around an axis parallel to the Y-axis and passing through the centroid is I , then the ratio between the length of the sides in the X-axis direction and the length of the sides in the Y-axis direction is (I ) :(I ) .