The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 2003

Filed:

Oct. 18, 1999
Applicant:
Inventor:

Imad Mahawili, Grand Rapids, MI (US);

Assignee:

Micro C Technologies, Inc., Kentwood, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/100 ; C23C 1/600 ;
U.S. Cl.
CPC ...
H01L 2/100 ; C23C 1/600 ;
Abstract

A platform for supporting a semiconductor substrate during processing in a processing chamber includes a body having a first support surface for supporting the substrate thereon and a second support surface for being supported by a rotatable housing over a heater in the processing chamber. The body comprises a quartz material, with at least a portion of the quartz material being adapted to be opaque to block transmission of photon energy through that portion during heating. For example, the quartz material may include a coating over at least a portion of the quartz material, with the coating adapting the quartz material to be opaque. In preferred form, the coating comprises a composite film of silicon and silicon carbide.

Published as:
EP1094502A2; KR20010040102A; JP2001189375A; TW492129B; US6530994B1; KR100441363B1;

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