The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2003
Filed:
Nov. 14, 2000
Frank Voss, Bad Ganders-heim, DE;
Lambda Physik AG, Goettingen, DE;
Abstract
A beam parameter monitoring unit is provided for use with a F2 laser system including means for filtering the red light from the VUV light of a beam portion split off from the mainbeam of the F2 laser before the beam portion reaches a detector. The filtering means includes a mirror that is highly reflective of VUV light (“VUV HR mirror”), particularly around 157 nm, and transparent to red light. The VUV HR mirror reflects the VUV light to a detector such that the properties and parameters of the main beam can be monitored, adjusted, controlled and/or stabilized. The VUV HR mirror is preferably surrounded by a shield for absorbing the red light transmitted through or around the VUV HR mirror. Also preferably, an aperture is provided that is just wide enough to permit the VUV radiation to substantially pass through, and to block the outer portions of the incident beam portion including substantially only red light. In addition, the beam parameter monitoring unit is enclosed in a sealed enclosure free of species that absorb VUV light such as oxygen, water vapor and hydrocarbons.