The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2003
Filed:
Apr. 27, 2001
Mehrdad Mahanpour, Union City, CA (US);
Mohammad Massoodi, Los Altos, CA (US);
Jose Hulog, San Jose, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method and system for deprocessing a semiconductor device is disclosed. The semiconductor device has a plurality of structures and an intermetal dielectric layer. The method and system include anisotropically plasma etching the intermetal dielectric layer at an oblique angle and rotating the semiconductor device during the plasma etch to reduce or eliminate build up of a material on the plurality of structures due to the plasma etch of the intermetal dielectric layer. In another aspect the method and system include a semiconductor device deprocessed using the method in accordance with the present invention. In another aspect, the present invention includes a system for deprocessing the semiconductor device.