The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2003
Filed:
Aug. 31, 2000
Jiro Kajiwara, Cupertino, CA (US);
David A. Hansen, Palo Alto, CA (US);
Gerard S. Moloney, Milpitas, CA (US);
Multi-Planar Technologies, Inc., San Jose, CA (US);
Abstract
A polishing apparatus ( ) and method for polishing and planarizing a substrate ( ) is provided that achieves a high-planarization uniformity across the substrate, while providing a more efficient use of slurry. In one embodiment, the apparatus ( ) includes a subcarrier ( ) with a flexible member ( ) attached to a lower surface ( ) of it on which the substrate is held. The flexible member ( ) has at least one hole ( ) therein so that a pressurized fluid introduced between the flexible member and the subcarrier ( ) directly presses the substrate ( ) against a polishing surface ( ) during operation. The number and size of the holes ( ) are selected to provide sufficient friction between the flexible member ( ) and the substrate ( ) to cause it to rotate when a drive mechanism rotates the subcarrier ( ). In another embodiment, the subcarrier ( ) further includes a port adapted to draw a vacuum on a cavity ( ) between the lower surface ( ) and the flexible member ( ), and the flexible member and the substrate ( ) serve as a valve ( ) to isolate the port from the cavity when a predetermined vacuum has been achieved.