The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2003

Filed:

Sep. 15, 2000
Applicant:
Inventor:

Tomio Katata, Yokohama, JP;

Assignee:

Kabushiki Kaisha Toshiba, Kawasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 4/500 ; C23C 1/434 ;
U.S. Cl.
CPC ...
B01D 4/500 ; C23C 1/434 ;
Abstract

A semiconductor device manufacturing apparatus employs filters. The filters have openings whose diameters are reduced in proportion to the distances of the filters from cathodes. This arrangement improves the directivity of sputtered particles and evenly distributes particles among the filters to form thin films on the filters. The peripheries of the openings on the filters are curved toward the cathodes, to increase a particle catching area of each filter and thin a film to be formed on each filter. Even if the films on the filters peel off, they never go beyond the curved peripheries of the filters and never drop onto a substrate from which semiconductor devices are produced.


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