The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2003
Filed:
May. 24, 2000
Li-Ming Wang, Taoyuan, TW;
Kao-Tsair Tsai, Kaohsiung, TW;
Winbond Electronics Corp., Hsinchu, TW;
Abstract
A multilayer photoresist process in photolithography, which is applicable on a substrate having a composite photoresist layer with a desired thickness formed thereon. The present invention provides a process, comprising the following steps. A photoresist layer is formed on a substrate, and subsequently exposed through a photomask, followed by the developing process to pattern the photoresist. Then, the patterned photoresist layer is stabilized. This sequence is repeated untill at least another one layer is deposited and patterned on the substrate. Each photoresist layer has almost the same pattern with the underlying patterned photoresist layer. Many thin photoresist layers are accumulated to form a composite photoresist layer with a desired thickness.