The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2003
Filed:
Jun. 13, 2001
Brian Scott Felker, Orefield, PA (US);
Ronald Martin Pearlstein, Macungie, PA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
A method for etching features into a substrate by removing substrate material from selected areas while leaving the substrate substantially unaffected in other areas is provided including the steps of providing the substrate to be etched into a process chamber, providing a patterned mask on the substrate as a guide for selective removal of the substrate, the substrate having a mask area and mask-free area, introducing a chemical species of halogenated heterocylic hydrocarbons into the process chamber, applying excitation energy to the process chamber to cause the chemical species to dissociate and form reactive ions and neutral species, and maintaining an electric potential gradient in an area adjacent the substrate to impose directionality and anisotropy to the etch.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile