The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2003
Filed:
Oct. 30, 1998
Akiyoshi Itoh, Chiba, JP;
Katsuji Nakagawa, Tokyo, JP;
Manabu Tani, Chiba, JP;
Toshio Uehara, Chiba, JP;
Bruce T. Williams, Lockport, NY (US);
Trek, Inc., Medina, NY (US);
Abstract
An electrostatic force microscope wherein electrostatic force applied to the detector is determined through obtaining the field distribution on several different shaped detectors with the calculation of the voltage distribution near the detector with the Finite Element Method to direct the measurement of the absolute charge amount on surface under test so that one can define the differences between the analysis and the results from the parallel plate model. Of interest is how large the error in the charge detection occurs in conjunction with thickness change of dielectric materials to be tested. There is provided a detector with cantilever which has proper shape for the spatial resolution of 10&mgr; made out of nickel foil for an electrostatic force microscope and the electrostatic force which appeared on it has been calculated.