The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2003
Filed:
Sep. 21, 1999
Shinichi Kojima, Kumagaya, JP;
Koichi Kamijo, Kumagaya, JP;
Nikon Corporation, Tokyo, JP;
Abstract
Charged-particle-beam microlithography apparatus are disclosed that exhibit minimal deflection aberrations while providing large-magnitude deflections of the charged particle beam using a relatively small excitation current. The apparatus comprises multiple deflectors. A representative deflector comprises a toroidal deflector coil having a semi-angle of 72° and a toroidal saddle deflector coil having a semi-angle of 36°. By adjusting the dimensions and number of windings of each coil, and the excitation current applied to each coil, magnetic-field components associated with cos[3&phgr;] and with cos[5&phgr;], which are higher-order components in the deflection field, are minimized. As a result, four-fold aberrations are minimized and deflection sensitivity is increased.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile