The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2003

Filed:

May. 11, 2000
Applicant:
Inventors:

H. Garrett Wada, Atherton, CA (US);

Anne R. Kopf-Sill, Portola Valley, CA (US);

Marja Liisa Alajoki, Palo Alto, CA (US);

J. Wallace Parce, Palo Alto, CA (US);

Benjamin N. Wang, Palo Alto, CA (US);

Andrea W. Chow, Los Altos, CA (US);

Robert S. Dubrow, San Carlos, CA (US);

Assignee:

Caliper Technologies Corp., Mountain View, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 7/00 ;
U.S. Cl.
CPC ...
G01N 7/00 ;
Abstract

Methods and systems for particle focusing to increase assay throughput in microscale systems are provided. The invention includes methods for providing substantially uniform flow velocity to flowing particles in microfluidic devices. Methods of sorting members of particle populations, such as cells and various subcellular components are also provided. Integrated systems in which particles are focused and/or sorted are additionally included.

Published as:
CA2373347A1; WO0070080A1; AU5015800A; EP1179087A1; US6506609B1; AU770678B2; EP1179087A4; EP1179087B1;

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