The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2003
Filed:
Apr. 30, 2001
Masanori Ono, Narita, JP;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A sputtering apparatus is provided with a plurality of ringlike targets arranged on a concentric basis in upper part of a process chamber. A pedestal for holding a semiconductor substrate is placed inside the process chamber and a dc power supply is connected to the targets and to the pedestal. Further, the process chamber is connected to a vacuum pump for evacuating the inside thereof and a gas supply for introducing a process gas for generation of plasma, normally argon gas, into the inside of the process chamber. Sputtering yields of the targets can be adjusted by separately controlling potentials of the respective targets. This permits the apparatus to improve uniformity of deposition.