The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2002
Filed:
Jun. 07, 1999
Hans M. Christen, Burtonsville, MD (US);
Neocera, Inc., Beltsville, MD (US);
Abstract
There is provided a deposition system ( ) for yielding substantially uniform deposition of an evaporant material onto a substrate. The deposition system ( ) comprises: a source ( ) for generating a coherent energy beam; a substantially planar target ( ) containing the evaporant material and disposed in spaced relation to the substrate; a focusing element ( ) optically coupled to the source for focusing the coherent energy beam onto the target ( ); and, an actuator ( ) coupled to the focusing element ( ) for reversibly translating the focusing element ( ) along a scanning path directed substantially parallel to a target plane defined by the target ( ). The focused coherent energy beam defines an impingement spot ( ) on the target ( ). The impingement spot ( ) is displaced responsive to the translation of the focusing element ( ) along the scanning path. The focus of the coherent energy beam on the target ( ) thus remains substantially preserved.