The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2002
Filed:
Oct. 22, 1999
Tsutomu Higo, Tokyo, JP;
Massahiro Roberto Serikawa, Fujisawa, JP;
Ebara Corporation, Tokyo, JP;
Abstract
A method and apparatus for processing substances by coexisting an object matter with water held at temperature above 200° C. to carry out chemical reactions such as severing of molecular chains, recombination and decoupling occluded molecules, oxidation and reduction reactions. A mixture phase containing an object matter and a liquid medium is subjected to a super-critical state of a medium in a super-critical reaction apparatus, where feed inlets are provided on the upper end, and a product outlet is provided on the lower end. In the interior of the apparatus, the super-critical zone is provided above and the sub-critical zone is provided below, and the object matter and the reaction products are progressed towards a lower end of a reaction chamber in one direction.