The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2002
Filed:
Jul. 10, 2000
Alexander Leybovich, Hilliard, OH (US);
Tosoh SMD, Inc., Grove City, OH (US);
Abstract
A sputtering target ( ) under test is irradiated with an ultrasonic pulse ( ). The ultrasonic pulse ( ) has a wavelength in the sputtering target ( ) in the range of the average grain size for the target ( ) under test. Backscattering echoes ( ) are produced by the interaction of the pulse ( ) with grain boundaries in the target ( ) under test. The backscattering echoes ( ) are detected and a representative electrical signal is generated. The number of occurrences of the backscattering echoes ( ) having amplitudes within predetermined ranges are determined. A histogram of the number of occurrences versus amplitude is plotted. The histogram for the target ( ) under test is compared with reference histograms for sputtering targets having known crystallographic orientations to determine the texture of the target ( ) under test.