The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2002
Filed:
Feb. 16, 2000
Hidetoshi Ohnuma, Kanagawa, JP;
Sony Corporation, , JP;
Abstract
The present invention provides a correcting method of exposure pattern, an exposure method, a exposure system, a photomask and a semiconductor device, which can simplify an operation required for correcting an optical proximity effect of a light shielding film pattern and data processing. A serif pattern ( ) relative to a light shielding film pattern ( ) constituting a layout-designed exposure pattern ( ) is prepared, and the light shielding film pattern ( ) and the serif pattern ( ) is graphically computed so as to correct the light shielding film pattern ( ). An optical proximity effect in exposure is corrected by using the light shielding film pattern ( ), and thereby, it is possible to simplify operational processing required for making an optical proximity effect correction with respect to the light shielding film pattern ( ), and to considerably shorten a processing time for making the optical proximity effect correction.