The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2002

Filed:

May. 14, 2001
Applicant:
Inventors:

Sheng Hsiung Chen, Taichung Connty, TW;

Tsu Shi, Hsin-Chu, TW;

Ming Tsai, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/940 ;
U.S. Cl.
CPC ...
H01L 2/940 ;
Abstract

As current densities through wiring in integrated circuits increases, so too do failures due to electromigration. Such failure almost always occur in vias located at the ends of long lines. The present invention solves this problem by introducing, as part of the wiring, local back-diffusion sources that serve to increase back pressure on the metallic ions that makes up the wire, thereby reversing the trend towards electromigration. These sources are located close to the vias in question and may take the form of discrete local areas where the wiring is wider or they may be introduced in the form of dummy vias.


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