The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2002
Filed:
Jan. 09, 2001
Thomas E. Lewis, East Hampstead, NH (US);
Presstek, Inc., Hudson, NH (US);
Abstract
Lithographic plate constructions include imaging layers having dispersed therein a radiation-scattering material and a radiation-absorbing material, both of which cooperate to increase the overall absorption of radiation in that layer. The radiation-scattering material may be in particulate form, the particles reflecting the imaging radiation from their surfaces. The use of particulate scattering material within the imaging layer creates a highly porous matrix that favors deep penetration of the imaging radiation and mechanical locking of the imaging layer to one or both adjacent layers. The scattering material may also be chosen also for its ability to chemically bind with an adjacent layer to increase intercoat adhesion.