The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2002
Filed:
Mar. 19, 2001
Jürgen Karl, München, DE;
Martin Zibert, Feldkirchen-Westerham, DE;
Valentin Rosskopf, Poettmess-Schorn, DE;
Infineon Technologies AG, München, DE;
Abstract
A method for fabricating and checking at least two structures of an electronic circuit in a semiconductor substrate. By using two different masks, in two method steps, identical configurations of first and second structures are produced in useful areas of the semiconductor substrate. In the scribe lines, bordering the useful area, only first structures are produced using the first mask and only second structures are produced using the second mask.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile