The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2002
Filed:
Oct. 05, 1999
Method and apparatus for running metrology standard wafer routes for cross-fab metrology calibration
Applicant:
Inventor:
William Jarrett Campbell, Austin, TX (US);
Assignee:
Advanced Micro Devices, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/900 ;
U.S. Cl.
CPC ...
G06F 1/900 ;
Abstract
The present invention provides for a method and an apparatus for running metrology standard wafer routes for calibrating metrology data. A processing order for a run of semiconductor devices is determined. A metrology route based upon the processing order is determined. A metrology standard device is routed through the metrology route. Measurement data relating to the metrology standard device being routed though the metrology route is acquired. Metrology data processing upon the acquired measurement data is performed.