The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2002

Filed:

Dec. 07, 1998
Applicant:
Inventor:

Han-Ming Sheng, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 ;
U.S. Cl.
CPC ...
G06K 9/00 ;
Abstract

A system and method for detecting defects in integrated circuit wafers related to photolithographic processing of the wafers. The system has an image processor, or image computer, and an image memory, which has image data for production wafer types stored therein. A defect detection wafer is scanned by an objective lens and the image is detected by an image detector. The image detector data output is fed to the image processor along with image data for a selected production wafer type from the memory. The image processor feeds image data to a visual display which displays a superimposed image of the defect detection wafer and the selected production wafer type. This superimposed image makes it easier to detect actual defects in a production wafer.


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