The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2002

Filed:

Jul. 12, 2000
Applicant:
Inventors:

Tien-Hao Tang, Taipei Hsien, TW;

Shiao-Shien Chen, Chung-Li, TW;

Chen-Chung Hsu, Hsinchu Hsien, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H02H 9/00 ;
U.S. Cl.
CPC ...
H02H 9/00 ;
Abstract

An electrostatic discharge protection apparatus. A drain region is formed under a pad. A gate is formed at a periphery of the pad, while a source region is formed at a periphery of the gate. Another kind of electrostatic discharge protection apparatus is also presented with a drain region formed under a pad. More than one gate is formed at a periphery of the pad, and each gate is surrounded with a source region. Further in the invention, an electrostatic discharge protection apparatus is further presented with a P-type and N-type drain region located under a pad. A first gate and a second gate are formed at a periphery of pad corresponding thereto, respectively. In the above manners, the layout of the electrostatic discharge protection can be highly packed, that is, the occupied area is greatly reduced.


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